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Conventionally, the fabrication of transparent silica glass structures via 3D printing requires high-temperature treatment exceeding 1000 °C to eliminate voids and achieve sufficient densification. This has led to challenges such as increased CO₂ emissions and limitations in applications involving multifunctional materials.

In this study, we employed a photochemical process using few-nanometer-sized silica nanoparticles, enabling 3D fabrication at room temperature and achieving transparent silica structures through a significantly reduced processing temperature of 400 °C.

These results not only contribute to the realization of energy-efficient glass manufacturing processes, but also suggest the potential for achieving transparent silica structures at the macroscale. This advancement is expected to open new opportunities for applications in complex-shaped optical materials and microdevices.

This work was primarily conducted by Kokita J (M1 at the time), in collaboration with Hinago D (Master’s graduate, FY2024) and Sony Group Corporation.

Okada K., Kokita J., Hinago D., Sakamoto S., Fukatsu A., Takahashi M., Low-Temperature Fabrication of Transparent Silica Structures via 3D Printing: A Sustainable Approach for Energy-Efficient Additive Manufacturing. ACS Appl. Eng. Mater (2026). https://doi.org/10.1021/acsaenm.5c01162