News
Oct 10, 2025
Our paper has been published in Nanoscale
We are pleased to announce that our paper has been published in Nanoscale. In this study, we discovered that irradiating two-dimensional semiconductors with laser light followed by immersion in water enables selective removal of the irradiated regions, allowing for effective patterning. This approach has the potential to mitigate issues found in conventional patterning techniques, such as resist residues in lithography and thermal damage in laser ablation.
The first author of this work is our alumnus, Mr. Tahara. You can read the paper at the following link: