論 文

2023

"Resist Characteristic of Chemically Amplified Three-Component Novolac Resist Containing a Dissolution Inhibitor with Different Protection Ratio"
K. TAKASHIMA, and H. HORIBE, J. Photopolym. Sci. Technol. 36(5), pp315-320 (2023).

"Clarification of Degradation of Aromatic Compounds by Oxygen Microbubbles Water"
M. MIZUTANI, and H. HORIBE, J. Photopolym. Sci. Technol. 36(5), pp321-326 (2023).

"Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment"
R. YASUKUNI, A. KOIZUMI, M. MIZUTANI, T. NAKAO, M. YOSHIMURA, H. HORIBE, and T. KAMIMURA, J. Photopolym. Sci. Technol. 36(5), pp271-277 (2023).

"Photoactive Compounds Effects on Removal Rate for Polystyrene-type Polymers by H2/O2 Mitxure Activated bu Hot Tungsten Wire"
M. YAMAMOTO, K. AKITA, T. MANIWA, M. ASAKAWA, T. SHIKAMA, S. NAGAOKA, H. UMEMOTO, and H. HORIBE, J. Photopolym. Sci. Technol. 36(5), pp283-291 (2023).

2022

"High-speed imaging of photoresist stripping phenomena induced by laser irradiation without causing the laser damage"
Y. Matsumoto, N. Nishioka, A. Koizumi, A. Uemura, R. Nakamura, M. Yoshimura, H. Horibe, T. Kamimura, Laser-Induced Damage in Optical Materials 119101C (2021).

"Development of Bile Duct with Antifouling Property Using Atomospheric Pressure and Low Temperature Plasma"
M. Yamamoto, T. Hamasaki, A. Sekiguchi, H. Minami, M. Aikawa, H. Horibe, Photopolymer. Sci. and J. Photopolym. Sci. Technol., 35(3), 233 (2022).

2021

"Microstructure Formation on Poly (Methyl Methacrylate) Film Using Atmospheric Pressure Low-Temperature Plasma"
A. SEKIGUCHI, H. MINAMI, and H. HORIBE, J. Photopolym. Sci. Technol. 34(4), pp385-392 (2021).

"Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H2/O2 Mixtures Activated on a Tungsten Hot-wire Catalyst"
K. AKITA, S. SOGO, R. SOGAME, M. YAMAMOTO, S. NAGAOKA, H. UMEMOTO, and H. HORIBE, J. Photopolym. Sci. Technol. 34(5), pp499-504 (2021).

"Development of Bile Direct Stent Having Antifouling Properties by Atmospheric Pressure Low-Temperature Plasma"
A. SEKIGUCHI, M. YAMAMOTO, T. KUMAGAI, Y. MORI, H. MINAMI, K. AIKAWA, and H. HORIBE, J. Photopolym. Sci. Technol. 34(4), pp401-410 (2021).

"Improvement of Resist Characteristics by Synthesis of a Novel Dissolution Inhibitor for Chemically Amplified Three-Component Novolac Resist"
S. AKECHI, and H. HORIBE, J. Photopolym. Sci. Technol. 34(5), pp491-494 (2021).

"Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility"
S. KAJITA, Y. MIYAJI, and H. HORIBE, J. Photopolym. Sci. Technol. 34(5), pp495-498 (2021).

"Effect of pH on Decomposition of Organic Compounds Using Ozone Microbubble Water"
K. TSUJIMOTO, and H. HORIBE, J. Photopolym. Sci. Technol. 34(5), pp485-489 (2021).

"Enhanced decomposition of toxic pollutants by underwater pulsed discharge in the presence of hydrogen peroxide and microbubbles"
R. MATSUURA, N. KOMETANI, H. HORIBE, and T. SHIRAFUJI, Jap. J. Appl. Physics. in print (2021).

"Effect of pgsE expression on the molecular weight of poly(γ-glutamic acid) in fermentative production"
K. Fujita, T. Tomiyama, T. Inoi, T. Nishiyama, E. Sato, H. Horibe, R. Takahashi, S. Kitamura, Y. Yamaguchi, A. Ogita, T. Tanaka, Polym. J., 53, pages409-414(2021).

2020

"Concept model of atomic hydrogen dry developing process for photolithographic patterning"
Y. Takemori, M. Gohdo, Y. Koda, H. Horibe, AIP Adv., 10 105223 (2020).

 

"Microanalysis of Single Poly(N-isopropylacrylamide) Droplet Producedby an Optical Tweezer in Water: Isotacticity Dependence of Growth and ChemicalStructure of the Droplet"
K. Ushiro, T. Shoji, M. Matsumoto, T. Asoh, H. Horibe, Y. Katsumoto, Y.Tsuboi, J. Phys. Chem. B, 124(38), 8454-8463 (2020).

"Thermoresponsive Conductivity of Acrylamide-Based Polymers and Ni Microparticle Composites"
H. Onishi, Y. Koda, H. Horibe, Chem. Lett., 2020, 49, 1224-1227.

"Evaluation of Decomposition Property of Photoresist by Oxygen RadicalsUsing Helium-Oxygen Mixtures"
M. Yamamoto, K. Akita, S. Nagaoka, H. Umemoto, H. Horibe, J. Photopolym. Sci. Technol., 33(4), 433-437 (2020).

"Effects of Nitrogen Dilution on the Photoresist Removal Rate by Hydrogen Radicals"
M. Yamamoto, H. Nishioka, K. Akita, S. Nagaoka, H. Umemoto, H. Horibe, J. Photopolym. Sci. Technol., 33(4), 427-431 (2020).

2019

"Oxygen additive effects on decomposition rate of poly(vinyl phenol)-basedpolymers using hydrogen radicals produced by a tungsten hot-wire catalyst"
M. Yamamoto, S. Nagaoka, K. Ohdaira, H. Umemoto, H. Horibe, Thin Solid Films, 679, 22-26 (2019).

"A Comparison of Removal Phenomena in Photoresist Materials UsingLaser Irradiation"
T. Kamimura, N. Nishioka, Y. Umeda, D. Shima, Y. Fukamoto, Y. Harada, M.Yoshimura, R. Nakamura, and H. Horibe, J. Photopolym. Sci. Technol., 32(4), 603-607 (2019).

"Relationship between Oxygen Additive Amount and Photoresist RemovalRate Using H Radicals Generated on an Iridium Hot-Wire Catalyst"
M. Yamamoto, T. Shiroi, T. Shikama, S. Nagaoka, H. Umemoto, and H. Horibe, J. Photopolym. Sci. Technol., 32(4), 609-614 (2019).

"Oxidative Decomposition of Organic Compounds by Ozone Microbubblesin Water"
Y. Koda, T. Miyazaki, E. Sato, and H. Horibe, J. Photopolym. Sci. Technol., 32(4), 615-618 (2019).

"Reductants for Polyperoxides to Accelerate Degradation at ElevatedTemperatures"
E. Sato,* M. Yuri, A. Matsumoto, and H. Horibe, Polym. Degrad. Stab., 162, 47-54 (2019).

"Thermal Latent Reductants for Controlled Degradation of Polyperoxidesand Their Application to High Performance Dismantlable Adhesives"
E. Sato,* C. Omori, M. Yuri, Y. Koda, and H. Horibe, ACS Appl. Polym. Mater., 1(8), 2140-2148 (2019).

"Facile Synthesis of Graft Copolymers Containing Rigid Poly(dialkylfumarate) Branches by Macromonomer Method"
E. Sato,* N. Tamari, and H. Horibe, J. Polym. Sci.: Part A, Polym. Chem., Accepted.

2018

"Dynamics of the phase separation in a thermoresponsive polymer: accelerated phase separation of stereocontrolled poly(N,N-diethylacrylamide) in water"
M. Matsumoto, T. Tada, T. Asoh, T. Shoji, T. Nishiyama, H. Horibe, Y. Katsumoto,and Y. Tsuboi, Langmuir, 34(45), 13690-13696 (2018)

"Development of Dissolution Inhibitor in Chemically Amplified PositiveTone Thick Film Resist"
Y. Sotokawa, T. Nishiyama, E. Sato, and H. Horibe, J. Photopolym. Sci. Technol., 31(3), 399-402 (2018).

"Time-Resolved Analysis of Resist Stripping Phenomenon Using LaserIrradiation"
T. Kamimura, Y. Umeda, H. Kuramae, K. Nuno, R. Nakamura, H. Horibe, J. Photopolym. Sci. Technol., 31(3), 413-418 (2018).

"Fabrication of Mesoscopic Structure on PMMA Surface by Atomic Hydrogenand Evaluation of the Surface Functionality"
A. Matsuo, S. Takagi, T. Nishiyama, M. Yamamoto, E. Sato, and H. Horibe, J. Photopolym. Sci. Technol., 31(3), 369-372 (2018).

"Degradation of Poly(acrylic acid) in Aqueous Solution by Using O3 Microbubble"
T. Miyazaki, T. Nishiyama, E. Sato, and H. Horibe, J. Photopolym. Sci. Technol., 31(3), 409-412 (2018).

"Removal of Polymers for KrF and ArF Photoresist Using Hydrogen RadicalsContaining a Small Amount of Oxidizing Radicals"
M. Yamamoto, T. Taki, T. Sunada, T. Shikama, S. Nagaoka, H. Umemoto, andH. Horibe, J. Photopolym. Sci. Technol., 31(3), 419-424 (2018).

"Cross-linked Polyperoxides for Photoremovable Adhesives"
E. Sato,* C. Omori, T. Nishiyama, and H. Horibe, J. Photopolym. Sci. Technol., 31(4), 511-515 (2018).



2017年以前の研究成果

高分子化学研究室HPへのリンク