発表論文（安田グループ）

2025

1. Molecular dynamics simulation of the early stage of the development process of negative-type non-chemically amplified resist in electron-beam lithography 
   R. Tanaka, K. Yamada, K. Tada, H. Wakamatsu, M. Yasuda
   Journal of Vacuum Science and Technology B, 43(4) 042601-1-042601-8, Jul, 2025  Peer-reviewed
   https://doi.org/10.1116/6.0004443

2024

1. Novel approach for KrF chemically amplified resist optimization assisted by deep learning 
   C. Tang, T. Tanaka, A. Sekiguchi, Y. Hirai, M. Yasuda
   Journal of Vacuum Science and Technology B, 42(6) 062606-1-062606-8, Dec, 2024  Peer-reviewed
   https://doi.org/10.1116/6.0004096
2. Molecular Dynamics Simulation of Pattern Formation for Negative-Type Resists in Electron Beam Lithography 
   Kaito Yamada, Yoshihiko Hirai, Masaaki Yasuda
   Journal of Photopolymer Science and Technology, 37(1) 75-79, May 31, 2024  Peer-reviewed
   https://doi.org/10.2494/photopolymer.37.75
3. Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers 
   Kyohei Imai, Bunta Inoue, Yoshihiko Hirai, Masaaki Yasuda
   Journal of Photopolymer Science and Technology, 37(1) 109-114, May 31, 2024  Peer-reviewed
   https://doi.org/10.2494/photopolymer.37.109
4. The Development of Bile Duct Stent Having Antifouling Properties by Using Atmosphere Pressure Cold Plasma (2) 
   A. Sekiguchi, M. Yamamoto, M. Aikawa, M. Yasuda, Y. Hirai
   Journal of Photopolymer Science and Technology, 37(4) 371-378, 2024  Peer-reviewed
   https://doi.org/10.2494/photopolymer.37.371

2023

1. Developing a Laparoscope Lens with Super Water-Repellent Antifouling Function using Biomimetic Materials 
   Atsushi Sekiguchi, Hiroko Minami, Masaaki Yasuda, Yoshihiko Hirai
   Journal of Photopolymer Science and Technology, 36(3) 173-182, Jun 15, 2023  Peer-reviewed
   https://doi.org/10.2494/photopolymer.36.173
2. Prediction of secondary electron yield for metal materials using deep learning 
   Masahiro Kusumi, Bunta Inoue, Yoshihiko Hirai, Masaaki Yasuda
   Microscopy, 73(1) 31-36, Jun 10, 2023  Peer-reviewed
   https://doi.org/10.1093/jmicro/dfad034
3. Surface property control for 193 nm immersion resist by addition of Si compound 
   Chen Tang, Atsushi Sekiguchi, Yosuke Ohta, Yoshihiko Hirai, Masaaki Yasuda
   Journal of Vacuum Science & Technology B, 41(1) 012602, Jan 1, 2023  Peer-reviewed
   https://doi.org/10.1116/6.0002128

2022

1. Smart Systems for Material and Process Designing in Direct Nanoimprint Lithography Using Hybrid Deep Learning 
   Yoshihiko Hirai, Sou Tsukamoto, Hidekatsu Tanabe, Kai Kameyama, Hiroaki Kawata, Masaaki Yasuda
   Nanomaterials, 12(15) 2571-2571, Jul 27, 2022  Peer-reviewed
   https://doi.org/10.3390/nano12152571

2021

1. Automatic design of the build-in lens mask for three-dimensional photo lithography 
   Tomoaki Osumi, Masaru Sasago, Masaaki Yasuda, Yoshihiko Hirai
   Proceedings of SPIE - The International Society for Optical Engineering, 11908, 2021  
   https://doi.org/10.1117/12.2598156
2. Stochastic Simulation of Development Process in Electron Beam Lithography 
   Bunta Inoue, Masanori Koyama, Atsushi Sekiguchi, Masamitsu Shirai, Yoshihiko Hirai, Masaaki Yasuda
   Journal of Photopolymer Science and Technology, 34(6) 661-665, 2021  Peer-reviewed
   https://doi.org/10.2494/photopolymer.34.661
3. Effects of acid diffusion and resist molecular size on line edge roughness for chemically amplified resists in EUV lithography: computational study 
   M. Koyama, K. Imai, M. Shirai, Y. Hirai, M. Yasuda
   Jpn. J. Appl. Phys., 60 106505, 2021  Peer-reviewed
   https://doi.org/10.35848/1347-4065/ac26e5
4. Proposal of Hybrid Deep Learning System for Process and Material Design in Thermal Nanoimprint Lithography 
   S. Tsukamoto, H. Tanabe, R. Yamamura, K. Kameyama, H. Kawata, M. Yasuda, Y. Hirai
   J. Photopolym. Sci. Technol., 34(2) 145-148, 2021  Peer-reviewed
   https://doi.org/10.2494/photopolymer.34.145
5. Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask 
   T. Osumi, A. Misaka, K. Sato, M. Yasuda, M. Sasago, Y. Hirai
   J. Photopolym. Sci. Technol., 34(2) 123-126, 2021  Peer-reviewed
   https://doi.org/10.2494/photopolymer.34.123

2020

1. Fabrication of nickel plasma etching mask by nano-imprint lithography and electroless plating 
   Shingo Shimizu, Hideki Tanabe, Masaaki Yasuda, Yoshihiko Hirai, Hiroaki Kawata
   Journal of Photopolymer Science and Technology, 33(5) 551-556, 2020  
   https://doi.org/10.2494/photopolymer.33.551
2. Stochastic Simulation of Pattern Formation for Negative-Type Chemically Amplified Resists in Extreme Ultraviolet Lithography 
   M. Yasuda, M. Koyama, K. Imai, M. Shirai, H. Kawata, Y. Hirai
   J. Photopolym. Sci. Technol., 33 53-56, 2020  Peer-reviewed
   https://doi.org/10.2494/photopolymer.33.53

2019

1. Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography 
   M. Yasuda, M. Koyama, K. Fukunari, M. Shirai, H. Kawata, Y. Hirai
   J. Photopolym. Sci. Technol., 32 339-343, 2019  Peer-reviewed
   https://doi.org/10.2494/photopolymer.32.339
2. Fabrication of Self-Standing Polystyrene Thin Films with Fine Through Holes by Use of Water Soluble Resin Sacrificial Layer 
   H. Kawata, K. Uchida, M. Yasuda, Y. Hirai
   J. Photopolym. Sci. Technol., 32 137-141, 2019  Peer-reviewed
   https://doi.org/10.2494/photopolymer.32.137
3. Stochastic Simulation of Pattern Formation for Chemically Amplified Resist in Electron Beam Lithography 
   M. Koyama, M. Shirai, H. Kawata, Y. Hirai, M. Yasuda
   Jpn. J. Appl. Phys., 58 SDDB01, 2019  Peer-reviewed
   https://doi.org/10.7567/1347-4065/ab0acd

2018

1. Stochastic simulation of pattern formation in electron beam lithography 
   M. Yasuda, M. Koyama, M. Shirai, H. Kawata, Y. Hirai
   J. Vac. Sci. Technol. B, 36 06JA04, 2018  Peer-reviewed
   https://doi.org/10.1116/1.5049757
2. Transfer Printing by Use of Delayed UV Cure Resin for Fabricating Multilayer Structures 
   T. Yamamoto, M. Yasuda, Y. Hirai, H. Kawata
   J. Photopolym. Sci. Technol., 31 657-662, 2018  Peer-reviewed
   https://doi.org/10.2494/photopolymer.31.657
3. Computational Study of Pattern Formation in UV Nanoimprint Lithography 
   M. Yasuda, M. Koyama, R. Sakata, M. Shirai, H. Kawata, Y. Hirai
   J. Photopolym. Sci. Technol., 31 189-192, 2018  Peer-reviewed
   https://doi.org/10.2494/photopolymer.31.189
4. Study on induced strain in direct nanoimprint lithography 
   K. Watanabe, T. Iida, M. Yasuda, H. Kawata, Y. Hirai
   Jpn. J. Appl. Phys., 57 06HG04, 2018  Peer-reviewed
   https://doi.org/10.7567/jjap.57.06hg04

2017

1. Stochastic simulation of the UV curing process in nanoimprint lithography: Pattern size and shape effects in sub-50 nm lithography 
   Masanori Koyama, Masamitsu Shirai, Hiroaki Kawata, Yoshihiko Hirai, Masaaki Yasuda
   Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 35(6), Nov 1, 2017  Peer-reviewed
   https://doi.org/10.1116/1.4997295
2. Computational study on UV curing characteristics in nanoimprint lithography: Stochastic simulation 
   Masanori Koyama, Masamitsu Shirai, Hiroaki Kawata, Yoshihiko Hirai, Masaaki Yasuda
   JAPANESE JOURNAL OF APPLIED PHYSICS, 56(6) 06GL03, Jun, 2017  Peer-reviewed
   https://doi.org/10.7567/JJAP.56.06GL03
3. Multiscale Simulation of the Development Process in Electron Beam Lithography 
   Masaaki Yasuda, Sho Hitomi, Hiroaki Kawata, Yoshihiko Hirai
   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 30(2) 205-209, 2017  Peer-reviewed
   https://doi.org/10.2494/photopolymer.30.205

2016

1. Impact of template stiffness during peeling release in nanoimprint lithography 
   Florian Chalvin, Naoto Nakamura, Takamitsu Tochino, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 34(6), Nov 1, 2016  Peer-reviewed
   https://doi.org/10.1116/1.4962742
2. Three-dimensional imaging approach using built-in lens mask lithography 
   Toshiki Tanaka, Hisao Kikuta, Hiroaki Kawata, Masaaki Yasuda, Masaru Sasago, Yoshihiko Hirai
   MICROELECTRONIC ENGINEERING, 158 85-90, Jun, 2016  Peer-reviewed
   https://doi.org/10.1016/j.mee.2016.03.022
3. Resist behaviour during peeling release in nano-imprint lithography 
   Florian Chalvin, Naoto Nakamura, Takamitsu Tochino, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 9984, 2016  Peer-reviewed
   https://doi.org/10.1117/12.2240298
4. Multiphysics Simulation of Nanopatterning in Electron Beam Lithography 
   Masaaki Yasuda, Kazuhiro Tada, Masatoshi Kotera
   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 29(5) 725-730, 2016  Peer-reviewed
   https://doi.org/10.2494/photopolymer.29.725
5. Study on Induced Stress and Strain in Direct Nanoimprint Lithography 
   Tatsuya Iida, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 29(2) 225-230, 2016  Peer-reviewed
   https://doi.org/10.2494/photopolymer.29.225
6. Impact of Wafer Deformation on Pattern Fabrication for Thermal Nanoimprint Lithography 
   Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 29(2) 215-219, 2016  Peer-reviewed
   https://doi.org/10.2494/photopolymer.29.215

2015

1. Multiscale simulation of resist pattern shrinkage during scanning electron microscope observations 
   Masaaki Yasuda, Yuki Furukawa, Hiroaki Kawata, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 33(6), Nov 1, 2015  Peer-reviewed
   https://doi.org/10.1116/1.4935956
2. Correlation between electron-irradiation defects and applied stress in graphene: A molecular dynamics study 
   Shogo Kida, Masaya Yamamoto, Kazuhiro Tada, Hiroaki Kawata, Yoshihiko Hirai, Masaaki Yasuda
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 33(5) 05E127, Sep, 2015  Peer-reviewed
   https://doi.org/10.1116/1.4928414
3. Computational study of the effect of side wall quality of the template on release force in nanoimprint lithography 
   Takamitsu Tochino, Kimiaki Uemura, Marcin Michalowski, Kazuo Fujii, Masaaki Yasuda, Hiroaki Kawata, Zygmund Rymuza, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 54(6) 06FM06, Jun, 2015  Peer-reviewed
   https://doi.org/10.7567/JJAP.54.06FM06
4. Molecular Dynamics Study of Line Edge Roughness and the Proximity Effect in Electron Beam Lithography 
   Sho Hitomi, Katsushi Michishita, Hiroaki Kawata, Yoshihiko Hirai, Masaaki Yasuda
   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 28(5) 677-682, 2015  Peer-reviewed
   https://doi.org/10.2494/photopolymer.28.677
5. High Selective Plasma Etching of PMMA to PS 
   Kazuma Shimomukai, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 28(4) 569-572, 2015  Peer-reviewed
   https://doi.org/10.2494/photopolymer.28.569

2014

1. Computational study of the demolding process in nanoimprint lithography 
   Rina Takai, Masaaki Yasuda, Takamitsu Tochino, Hiroaki Kawata, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 32(6), Nov 1, 2014  Peer-reviewed
   https://doi.org/10.1116/1.4897138
2. Defect formation and transformation in graphene under electron irradiation: A molecular dynamics study 
   Masaya Yamamoto, Yoshiki Asayama, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 32(6), Nov 1, 2014  Peer-reviewed
   https://doi.org/10.1116/1.4897304
3. Impact of resist shrinkage on the template release process in nanoimprint lithography 
   Takamitsu Tochino, Takahiro Shiotsu, Kimiaki Uemura, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 32(6), Nov 1, 2014  Peer-reviewed
   https://doi.org/10.1116/1.4901874
4. Computational study of the demolding process in nanoimprint lithography 
   Rina Takai, Masaaki Yasuda, Takamitsu Tochino, Hiroaki Kawata, Yoshihiko Hirai
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 32(6) 06FG02, Nov, 2014  Peer-reviewed
   https://doi.org/10.1116/1.4897138
5. Molecular simulation of electron beam nanofabrication 
   Masaaki Yasuda, Kazuhiro Tada
   Computational Chemistry: Theories, Methods and Applications, 63-83, Jul 1, 2014  
   https://www.scopus.com/pages/publications/84958613416
6. Simulation of the template release process based on fracture mechanics in nanoimprint lithography 
   Takahiro Shiotsu, Kimiaki Uemura, Takamitsu Tochino, Shuuya Ooi, Yuuki Onishi, Masaaki Yasuda, Hiroaki Kawata, Takuya Kobayashi, Yoshihiko Hirai
   MICROELECTRONIC ENGINEERING, 123 105-111, Jul, 2014  Peer-reviewed
   https://doi.org/10.1016/j.mee.2014.05.023
7. Electron beam lithography simulation for sub-10 nm patterning 
   Katsushi Michishita, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 53(6) 06JB02, Jun, 2014  Peer-reviewed
   https://doi.org/10.7567/JJAP.53.06JB02
8. Molecular flow during polymer filling process in nanoimprint lithography 
   Masaaki Yasuda, Kosei Araki, Yoshihiko Hirai
   Advances in Nanotechnology, 11 103-117, Jan 1, 2014  
   https://www.scopus.com/pages/publications/84949221753
9. Interaction volume of electron beam in carbon nanomaterials: A molecular dynamics study 
   Masaaki Yasuda, Shinya Wakuda, Yoshiki Asayama, Hiroaki Kawata, Yoshihiko Hirai
   Materials Research Society Symposium Proceedings, 1700 29-35, 2014  Peer-reviewed
   https://doi.org/10.1557/opl.2014.675
10. Fabrication of Second Generation Replica Mold by Hybrid Polymer Material Ormostamp (TM) 
    Hayato Noma, Si Wang, Kimiaki Uemura, Kazuma Shimomukai, Masaaki Yasuda, Hiroaki Kawata, Hella-Christin Scheer, Yoshihiko Hirai
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 27(1) 95-98, 2014  Peer-reviewed
    https://doi.org/10.2494/photopolymer.27.95
11. Fabrication of Imprint Mold with Nanotrench Patterns by Edge Lithography 
    Hayato Noma, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 27(1) 91-94, 2014  Peer-reviewed
    https://doi.org/10.2494/photopolymer.27.95

2013

1. Correlation between electron irradiation defects and applied stress in carbon nanotubes: A molecular dynamics study 
   Masaaki Yasuda, Yoshinori Chihara, Kazuhiro Tada, Hiroaki Kawata, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 31(6) 06FF06, Nov, 2013  Peer-reviewed
   https://doi.org/10.1116/1.4823760
2. Simulation study on the template release mechanism and damage estimation for various release methods in nanoimprint lithography 
   Takahiro Shiotsu, Naoki Nishikura, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 31(6) 06FB07, Nov, 2013  Peer-reviewed
   https://doi.org/10.1116/1.4832215
3. Selective edge lithography for fabricating imprint molds with mixed scale patterns 
   Hayato Noma, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai, Junji Sakamoto
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 31(6) 06FB03, Nov, 2013  Peer-reviewed
   https://doi.org/10.1116/1.4832215
4. Molecular dynamics study of electron irradiation effects on mechanical properties of carbon nanotubes 
   Kazuhiro Tada, Masaaki Yasuda, Takaaki Mitsueda, Ryota Honda, Hiroaki Kawata, Yoshihiko Hirai
   MICROELECTRONIC ENGINEERING, 107 50-53, Jul, 2013  Peer-reviewed
   https://doi.org/10.1016/j.mee.2013.03.009
5. Computational study on polymer filling process in nanoimprint lithography for bi-layered resist 
   Kosei Araki, Masaaki Yasuda, Akira Horiba, Hiroaki Kawata, Yoshihiko Hirai
   Materials Research Society Symposium Proceedings, 1499 18-23, 2013  Peer-reviewed
   https://doi.org/10.1557/opl.2013.413
6. Pattern Size Trimming by UV Exposure for Resist Patterns Fabricated by Thermal Nanoimprint Lithography 
   Hayato Noma, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 26(1) 109-112, 2013  Peer-reviewed
   https://doi.org/10.2494/photopolymer.26.109
7. Molecular simulation of pattern formation in electron beam lithography 
   Masaaki Yasuda, Hirofumi Sakai, Rina Takai, Hiroaki Kawata, Yoshihiko Hirai
   Microelectronic Engineering, 112 287-290, 2013  Peer-reviewed
   https://doi.org/10.1016/j.mee.2013.03.119

2012

1. Molecular dynamics study of the structural modification of graphene by electron irradiation 
   Yoshiki Asayama, Masaaki Yasuda, Kazuhiro Tada, Hiroaki Kawata, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 30(6), Nov, 2012  Peer-reviewed
   https://doi.org/10.1116/1.4765630
2. Strength enhancement of nano patterns from edge lithography for nanoimprint mold 
   Junji Sakamoto, Hayato Noma, Norifumi Fujikawa, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   MICROELECTRONIC ENGINEERING, 98 189-193, Oct, 2012  Peer-reviewed
   https://doi.org/10.1016/j.mee.2012.07.038
3. Performance evaluation of carbon nanotube-based oscillators and bearings under electron irradiation: Molecular dynamics study 
   Masaaki Yasuda, Yoshinori Chihara, Ryosuke Mimura, Yoshihisa Kimoto, Hiroaki Kawata, Yoshihiko Hirai
   MICROELECTRONIC ENGINEERING, 97 241-246, Sep, 2012  Peer-reviewed
   https://doi.org/10.1016/j.mee.2012.05.047
4. Impact of Resist Shrinkage and Its Correction in Nanoimprint Lithography 
   Akira Horiba, Masaaki Yasuda, Hiroaki Kawata, Makoto Okada, Shinji Matsui, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 51(6) 06FJ06, Jun, 2012  Peer-reviewed
   https://doi.org/10.1143/JJAP.51.06FJ06
5. PEBSI - A Monte Carlo simulator for bremsstrahlung arising from electrons colliding with thin solid-state targets 
   G. Weber, R. Maertin, A. Surzhykov, M. Yasuda, V. A. Yerokhin, Th. Stoehlker
   NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 279 155-159, May, 2012  Peer-reviewed
   https://doi.org/10.1016/j.nimb.2011.10.048
6. Pattern Size Effects on Demolding Force for Imprint Process 
   Norihiro Fujikawa, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 25(2) 245-248, 2012  Peer-reviewed
   https://doi.org/10.2494/photopolymer.25.245
7. A Consideration of Important Factor on Demolding Force for Various Molds 
   Hiroaki Kawata, Jyunya Ishihara, Toshiaki Tanabe, Masaaki Yasuda, Yoshihiko Hirai
   JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 25(2) 223-226, 2012  Peer-reviewed
   https://doi.org/10.2494/photopolymer.25.223

2011

1. Computational study of electron-irradiation effects in carbon nanomaterials on substrates 
   Yoshinori Chihara, Masaaki Yasuda, Shinya Wakuda, Hiroaki Kawata, Yoshihiko Hirai
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29(6) 06FG09, Nov, 2011  Peer-reviewed
   https://doi.org/10.1116/1.3662409
2. High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography 
   J. Sakamoto, N. Fujikawa, N. Nishikura, H. Kawata, M. Yasuda, Y. Hirai
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29(6) 06FC15, Nov, 2011  Peer-reviewed
   https://doi.org/10.1116/1.3662080
3. Atomic step patterning in nanoimprint lithography: Molecular dynamics study 
   Kazuhiro Tada, Masaaki Yasuda, Geng Tan, Yumiko Miyake, Hiroaki Kawata, Mamoru Yoshimoto, Yoshihiko Hirai
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29(6) 06FC11, Nov, 2011  Peer-reviewed
   https://doi.org/10.1116/1.3659712
4. 25 nm Wide Silicon Trench Fabrication by Edge Lithography 
   Junji Sakamoto, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 50(8) 08KC03, Aug, 2011  Peer-reviewed
   https://doi.org/10.1143/JJAP.50.08KC03
5. Computational study on polymer filling process in nanoimprint lithography 
   Masaaki Yasuda, Kosei Araki, Akihiro Taga, Akira Horiba, Hiroaki Kawata, Yoshihiko Hirai
   MICROELECTRONIC ENGINEERING, 88(8) 2188-2191, Aug, 2011  Peer-reviewed
   https://doi.org/10.1016/j.mee.2011.01.016
6. High aspect ratio nano mold fabrication by advanced edge lithography without CVD 
   J. Sakamoto, T. Nishino, H. Kawata, M. Yasuda, Y. Hirai
   MICROELECTRONIC ENGINEERING, 88(8) 1992-1996, Aug, 2011  Peer-reviewed
   https://doi.org/10.1016/j.mee.2011.02.001
7. Computational study on structural modification of single-walled carbon nanotubes by electron irradiation 
   Masaaki Yasuda, Ryosuke Mimura, Hiroaki Kawata, Yoshihiko Hirai
   JOURNAL OF APPLIED PHYSICS, 109(5) 054304, Mar, 2011  Peer-reviewed
   https://doi.org/10.1063/1.3549728
8. Atomic step patterning in nanoimprint lithography: Molecular dynamics study 
   Kazuhiro Tada, Masaaki Yasuda, Geng Tan, Yumiko Miyake, Hiroaki Kawata, Mamoru Yoshimoto, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 29(6), 2011  Peer-reviewed
   https://doi.org/10.1116/1.3659712
9. High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography 
   J. Sakamoto, N. Fujikawa, N. Nishikura, H. Kawata, M. Yasuda, Y. Hirai
   Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 29(6), 2011  Peer-reviewed
   https://doi.org/10.1116/1.3662080
10. Computational study of electron-irradiation effects in carbon nanomaterials on substrates 
    Yoshinori Chihara, Masaaki Yasuda, Shinya Wakuda, Hiroaki Kawata, Yoshihiko Hirai
    Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 29(6), 2011  Peer-reviewed
    https://doi.org/10.1116/1.3662409

2010

1. Process-simulation system for UV-nanoimprint lithography 
   Mayuko Shibata, Akira Horiba, Yoshinori Nagaoka, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 28(6) C6M108-C6M113, Nov, 2010  Peer-reviewed
   https://doi.org/10.1116/1.3511789
2. Impact of substrate deformation on demolding force for thermal imprint process 
   H. Kawata, Y. Watanabe, N. Fujikawa, M. Yasuda, Y. Hirai
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 28(6) C6M77-C6M82, Nov, 2010  Peer-reviewed
   https://doi.org/10.1116/1.3517537
3. Impact of molecular size on resist filling process in nanoimprint lithography: Molecular dynamics study 
   Akihiro Taga, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 28(6) C6M68-C6M71, Nov, 2010  Peer-reviewed
   https://doi.org/10.1116/1.3511434
4. Molecular dynamics study on compressive strength of monocrystalline, nanocrystalline and amorphous Si mold for nanoimprint lithography 
   Kazuhiro Tada, Shuhei Horimoto, Yoshihisa Kimoto, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   MICROELECTRONIC ENGINEERING, 87(10) 1816-1820, Oct, 2010  Peer-reviewed
   https://doi.org/10.1016/j.mee.2009.10.026
5. Impact of molecular size on resist filling process in nanoimprint lithography: Molecular dynamics study 
   Akihiro Taga, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 28(6) M68-M71, 2010  Peer-reviewed
   https://doi.org/10.1116/1.3511434
6. Process-simulation system for UV-nanoimprint lithography 
   Mayuko Shibata, Akira Horiba, Yoshinori Nagaoka, Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 28(6) C6-M113, 2010  Peer-reviewed
   https://doi.org/10.1116/1.3511789
7. Impact of substrate deformation on demolding force for thermal imprint process 
   H. Kawata, Y. Watanabe, N. Fujikawa, M. Yasuda, Y. Hirai
   Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 28(6) C6-M82, 2010  Peer-reviewed
   https://doi.org/10.1116/1.3517537
8. Effects of Mold Side Wall Profile on Demolding Characteristics 
   Hiroaki Kawata, Kensuke Kubo, Yuuta Watanabe, Junji Sakamoto, Masaaki Yasuda, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 49(6), 2010  Peer-reviewed
   https://doi.org/10.1143/JJAP.49.06GL15

2009

1. Molecular Dynamics Study of Nanoimprint Lithography for Glass Materials 
   Kazuhiro Tada, Yoshihisa Kimoto, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 48(6) 06FH13, Jun, 2009  
   https://doi.org/10.1143/JJAP.48.06FH13
2. Fabrication of Cantilevers by Two-Step Transfer Process without Lithography 
   Hiroaki Kawata, Kenichi Ryugou, Saki Ohta, Masaaki Yasuda, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 48(6) 06FK04, Jun, 2009  
   https://doi.org/10.1143/JJAP.48.06FK04
3. Silicon template fabrication for imprint lithography with a very smooth side wall profile 
   Hiroaki Kawata, Masato Matsue, Kensuke Kubo, Masaaki Yasuda, Yoshihiko Hirai
   THIN SOLID FILMS, 517(14) 3862-3865, May, 2009  
   https://doi.org/10.1016/j.tsf.2009.01.162
4. Silicon template fabrication for imprint process with good demolding characteristics 
   Hiroaki Kawata, Masato Matsue, Kensuke Kubo, Masaaki Yasuda, Yoshihiko Hirai
   MICROELECTRONIC ENGINEERING, 86(4-6) 700-704, Apr, 2009  
   https://doi.org/10.1016/j.mee.2008.11.030
5. Molecular dynamics study on resolution in nanoimprint lithography for glass material 
   Kazuhiro Tada, Masaaki Yasuda, Yoshihisa Kimoto, Hiroaki Kawata, Yoshihiko Hirai
   Materials Research Society Symposium Proceedings, 1179 88-92, 2009  
   https://doi.org/10.1557/proc-1179-bb06-11
6. Molecular dynamics study on mold fracture by nano scale defects in nanoimprint lithography 
   K. Tada, M. Yasuda, N. Fujii, H. Kawata, Y. Hirai
   Proceedings of SPIE - The International Society for Optical Engineering, 7470, 2009  
   https://doi.org/10.1117/12.835201

2008

1. Time-dependent charge distributions in polymer films under electron beam irradiation 
   Masaaki Yasuda, Yasuaki Kainuma, Hiroaki Kawata, Yoshihiko Hirai, Yasuhiro Tanaka, Rikio Watanabe, Masatoshi Kotera
   JOURNAL OF APPLIED PHYSICS, 104(12) 124904, Dec, 2008  
   https://doi.org/10.1063/1.3041648
2. Sheath Voltage Estimation for Inductively Coupled Plasma Etcher by Impedance Analysis 
   Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 47(8) 6914-6916, Aug, 2008  
   https://doi.org/10.1143/JJAP.47.6914
3. Analysis of charging phenomena of polymer films on silicon substrates under electron beam irradiation 
   Masaaki Yasuda, Kosuke Morimoto, Yasuaki Kainuma, Hiroaki Kawata, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 47(6) 4890-4892, Jun, 2008  
   https://doi.org/10.1143/JJAP.47.4890
4. Cantilever fabrication by force-free release transfer 
   Hiroaki Kawata, Kenichi Ryugou, Saki Ohta, Masaaki Yasuda, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 47(6) 5248-5251, Jun, 2008  
   https://doi.org/10.1143/JJAP.47.5248
5. Molecular dynamics study of yield stress of si Mold for nanoimprint lithography 
   Kazuhiro Tada, Masaaki Yasuda, Yoshihisa Kimoto, Hiroaki Kawata, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS, 47(4) 2320-2323, Apr, 2008  
   https://doi.org/10.1143/JJAP.47.23201
6. Molecular dynamics study of electron irradiation damages in carbon nanomaterials 
   Masaaki Yasuda, Takashi Majima, Yoshihisa Kimoto, Kazuhiro Tada, Hiroaki Kawata, Yoshihiko Hirai
   Materials Research Society Symposium Proceedings, 1057 65-69, 2008  
   https://doi.org/10.1557/PROC-1057-II10-28
7. The dependence of demolding characteristics on side wall roughness of mold in thermal imprint 
   Hiroaki Kawata, Junya Ishihara, Masayo Kayama, Masaaki Yasuda, Yoshihiko Hirai
   IEEJ Transactions on Sensors and Micromachines, 128(8) 3-330, 2008  
   https://doi.org/10.1541/ieejsmas.128.325

2007

1. Molecular dynamics study of electron-irradiation effects in single-walled carbon nanotubes 
   Masaaki Yasuda, Yoshihisa Kimoto, Kazuhiro Tada, Hideki Mori, Seiji Akita, Yoshikazu Nakayama, Yoshihiko Hirai
   PHYSICAL REVIEW B, 75(20) 205406, May, 2007  
   https://doi.org/10.1103/PhysRevB.75.205406
2. Fabrication of Si mold with smooth side wall by new plasma etching process 
   Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   MICROELECTRONIC ENGINEERING, 84(5-8) 1140-1143, May, 2007  
   https://doi.org/10.1016/j.mee.2007.01.216
3. Molecular dynamics study of nanoimprint lithography for glass material 
   K. Tada, Y. Kimoto, M. Yasuda, S. Horimoto, H. Kawata, Y. Hirai
   MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS, 322-323, 2007  Peer-reviewed
   https://doi.org/10.1109/IMNC.2007.4456234
4. Dependence of Mold conditions on demolding force - Effects of water contact angle and pattern shape around top surface 
   M. Kayama, J. Ishihara, H. Kawata, M. Yasuda, Y. Hirai
   MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS, 306-307, 2007  Peer-reviewed
   https://doi.org/10.1109/IMNC.2007.4456226
5. Analysis of charging phenomena of polymer films in scanning electron microscopy 
   K. Morimoto, M. Yasuda, Y. Tanaka, R. Watanabe, H. Kawata, Y. Hirai
   MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS, 50-+, 2007  Peer-reviewed
   https://doi.org/10.1109/IMNC.2007.4456099

2006

1. Si etching with high aspect ratio and smooth side profile for mold fabrication 
   Hiroaki Kawata, Masaaki Yasuda, Yoshihiko Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 45(6B) 5597-5601, Jun, 2006  
   https://doi.org/10.1143/JJAP.45.5597
2. Simple method for ion current measurement at RF biased electrode 
   H Kawata, M Yasuda, Y Hirai
   THIN SOLID FILMS, 506 683-687, May, 2006  
   https://doi.org/10.1016/j.tsf.2005.08.116

2005

1. A simulation of energy-filtered backscattered electron signals from subsurface Cu interconnect structures 
   M Yasuda, Y Suzuki, H Kawata, Y Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 44(7B) 5515-5519, Jul, 2005  
   https://doi.org/10.1143/JJAP.44.5515

2004

1. A Monte Carlo calculation of secondary electron emission from organic compounds 
   M Yasuda, T Nobuo, H Kawata
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 43(6B) 4004-4008, Jun, 2004  
   https://doi.org/10.1143/JJAP.43.4004
2. Ni cantilever fabrication by transfer process without sacrificial layer 
   H Kawata, M Yasuda, Y Hirai
   SENSORS AND MATERIALS, 16(4) 211-222, 2004  
   https://www.webofscience.com/wos/woscc/full-record/WOS:000224661400005
3. Fabrication Process for Surface Micromachine with Small Sticking Problem by Use of Image Reversal Resist as Sacrificial Layer 
   Hiroaki Kawata, Masaaki Yasuda
   IEEJ Transactions on Sensors and Micromachines, 124(3) 69-74, 2004  
   https://doi.org/10.1541/ieejsmas.124.69

2003

1. New fine metal pattern fabrication by transferral process 
   H Kawata, T Ueno, M Yasuda, Y Hirai
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 42(6B) 3854-3858, Jun, 2003  
   https://doi.org/10.1143/JJAP.42.3854
2. Analysis of backscattered electron signals in X-ray mask inspection 
   M Yasuda, H Kawata
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 42(6B) 3946-3949, Jun, 2003  
   https://doi.org/10.1143/JJAP.42.3946
3. A Monte Carlo calculation of secondary electron emission from organic compounds 
   T. Nobuo, M. Yasuda, H. Kawata
   Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003, 312-313, 2003  Peer-reviewed
   https://doi.org/10.1109/IMNC.2003.1268771
4. Monte Carlo study of the spin polarization enhancement in the low-energy secondary electron emission from ferromagnetic materials 
   M Yasuda, R Katsuse, H Kawata, K Murata
   SURFACE AND INTERFACE ANALYSIS, 35(1) 84-88, Jan, 2003  
   https://doi.org/10.1002/sia.1499

2002

1. Quantitative electron microprobe analysis of aluminum, copper, and gold thin films on silicon substrates 
   M Yasuda, S Yamauchi, H Kawata, K Murata
   JOURNAL OF APPLIED PHYSICS, 92(6) 3404-3409, Sep, 2002  
   https://doi.org/10.1063/1.1502923
2. A Monte Carlo study of magnetic domain images in a spin-polarized scanning electron microscope 
   M Yasuda, R Katsuse, H Kawata, K Murata
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 41(6B) 4246-4249, Jun, 2002  
   https://doi.org/10.1143/JJAP.41.4246
3. Long Ni cantilever fabrication with new sacrificial process 
   H Kawata, J Tabata, T Matsunaga, M Yasuda, K Murata
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 41(6B) 4327-4331, Jun, 2002  
   https://doi.org/10.1143/JJAP.41.4327
4. Analysis of backscattered electron signals in X-ray mask inspection 
   M. Yasuda, H. Kawata
   2002 International Microprocesses and Nanotechnology Conference, MNC 2002, 260-261, 2002  Peer-reviewed
   https://doi.org/10.1109/IMNC.2002.1178642

2001

1. A Monte Carlo study of spin-polarized electron backscattering from gold thin films 
   M Yasuda, K Tamura, H Kawata, K Murata, M Kotera
   NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 183(3-4) 196-202, Oct, 2001  
   https://doi.org/10.1016/S0168-583X(01)00707-8
2. Performance evaluation of the multi-stage Mott polarimeter using the Monte Carlo simulation 
   K Tamura, M Yasuda, M Kotera, K Murata
   REVIEW OF SCIENTIFIC INSTRUMENTS, 72(10) 3921-3926, Oct, 2001  
   https://doi.org/10.1063/1.1379600
3. Simulation of spin-polarized secondary electrons 
   M Yasuda, K Tamura, H Kawata, K Murata
   JOURNAL OF PHYSICS D-APPLIED PHYSICS, 34(13) 1955-1958, Jul, 2001  
   https://doi.org/10.1088/0022-3727/34/13/305
4. Long Ni cantilever fabrication with new sacrificial process 
   H Kawata, J Tabata, M Yasuda, K Murata
   MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 54-55, 2001  Peer-reviewed
   https://doi.org/10.1109/IMNC.2001.984065
5. A Monte Carlo study of magnetic domain images in a spin-polarized scanning electron microscope 
   M Yasuda, R Katsuse, H Kawata, K Murata
   MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 242-243, 2001  Peer-reviewed
   https://doi.org/10.1109/IMNC.2001.984180
6. Analysis of the spin polarization of secondary electrons emitted from Au/Fe 
   M Yasuda, K Tamura, H Kawata, K Murata, T Furukawa, K Koike
   APPLIED SURFACE SCIENCE, 169(170/) 78-81, Jan, 2001  
   https://doi.org/10.1016/S0169-4332(00)00643-7
7. Monte Carlo study of backscattered electron signals from microstructures of x-ray masks 
   M Yasuda, K Fujii, H Kawata, K Murata
   OPTIK, 112(8) 321-328, 2001  
   https://doi.org/10.1078/0030-4026-00064
8. Monte Carlo simulation of spin-polarized secondary electrons 
   M. Yasuda, K. Tamura, R. Katsuse, H. Kawata, K. Murata
   Shinku/Journal of the Vacuum Society of Japan, 44(3) 256-259, 2001  
   https://doi.org/10.3131/jvsj.44.256
9. Relations between antenna coil current and plasma parameters for inductive coupled plasmas 
   H. Kawata, H. Iyanaga, T. Matsunaga, M. Yasuda, K. Murata
   Shinku/Journal of the Vacuum Society of Japan, 44(3) 260-263, 2001  
   https://doi.org/10.3131/jvsj.44.260

2000

1. Fabrication of a new electrostatic linear actuator 
   T Matsunaga, K Kondoh, M Kumagae, H Kawata, M Yasuda, K Murata, M Yoshitake
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 39(12B) 7115-7119, Dec, 2000  
   https://doi.org/10.1143/JJAP.39.7115
2. Analysis of primary energy dependence of secondary electron polarization 
   M Yasuda, K Tamura, H Kawata, K Murata
   MICROBEAM ANALYSIS 2000, PROCEEDINGS, (165) 281-282, 2000  Peer-reviewed
   https://www.webofscience.com/wos/woscc/full-record/WOS:000166835400141
3. Quantitative electron microprobe analysis of thin films on substrates 
   S Yamauchi, M Yasuda, K Murata
   MICROBEAM ANALYSIS 2000, PROCEEDINGS, (165) 291-292, 2000  Peer-reviewed
   https://doi.org/10.1147/rd.184.0352
4. Fabrication of new electrostatic linear actuator 
   T Matsunaga, K Kondoh, M Kumagae, H Kawata, M Yasuda, K Murata
   MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS, 84-85, 2000  Peer-reviewed
   https://doi.org/10.1109/IMNC.2000.872634
5. Simulation of electron scattering for the Mott polarimeter 
   K Tamura, M Yasuda, K Murata, M Kotera
   MICROBEAM ANALYSIS 2000, PROCEEDINGS, (165) 287-288, 2000  Peer-reviewed
   https://www.webofscience.com/wos/woscc/full-record/WOS:000166835400144
6. Analysis of backscattered electron images of GaAs/AlxGa1-xAs superlattices 
   Masaaki Yasuda, Takeshi Une, Hiroaki Kawata, Kenji Murata
   Shinku/Journal of the Vacuum Society of Japan, 43(3) 255-258, 2000  
   https://doi.org/10.3131/jvsj.43.255
7. Analysis of magnetic-domain contrast of the spin-SEM 
   Keiji Tamura, Masaaki Yasuda, Kenji Murata, Masatoshi Kotera
   Shinku/Journal of the Vacuum Society of Japan, 43(3) 259-262, 2000  
   https://doi.org/10.3131/jvsj.43.259

1999

1. Analysis of the spin polarization of secondary electrons emitted from permalloy polycrystals 
   K Tamura, M Yasuda, K Murata, K Koike, M Kotera
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 38(12B) 7173-7175, Dec, 1999  
   https://doi.org/10.1143/JJAP.38.7173
2. In situ measurements of the resist etch rate for submicron patterns 
   H Kawata, H Fukuda, T Matsunaga, M Yasuda, K Murata
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 38(7B) 4478-4482, Jul, 1999  
   https://doi.org/10.1143/JJAP.38.4478
3. Study on sensitization of the Mott polarimeter 
   Keiji Tamura, Masaaki Yasuda, Kenji Murata, Masatoshi Kotera, Kazuyuki Koike
   Shinku/Journal of the Vacuum Society of Japan, 42(3) 361-364, 1999  
   https://doi.org/10.3131/jvsj.42.361

1998

1. A simulation of electron scattering in magnetic materials 
   K Tamura, M Yasuda, K Murata, M Kotera
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 37(12B) 7028-7031, Dec, 1998  
   https://doi.org/10.1143/JJAP.37.7028
2. Power measurements for radio-frequency discharges with a parallel-plate-type reactor 
   H Kawata, T Kubo, M Yasuda, K Murata
   JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 145(5) 1701-1708, May, 1998  
   https://doi.org/10.1149/1.1838543

1997

1. Resist etching with parallel-plate RF plasmas enhanced by a cusp magnetic field 
   H Kawata, T Kubo, M Yasuda, K Murata
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 36(7B) 4879-4885, Jul, 1997  
   https://doi.org/10.1143/JJAP.36.4879

1996

1. The spatial distribution of backscattered electrons calculated by a simple model 
   M Yasuda, H Kawata, K Murata
   PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 153(1) 133-144, Jan, 1996  
   https://doi.org/10.1002/pssa.2211530112
2. Monte Carlo simulation of secondary electron emission from thin film/substrate targets 
   K. Murata, M. Yasuda, H.Kawata
   Scanning Microscopy, 10(3) 613, 1996  
   https://digitalcommons.usu.edu/microscopy/vol10/iss3/1

1995

1. EFFECTS OF THE INTRODUCTION OF THE DISCRETE ENERGY-LOSS PROCESS INTO MONTE-CARLO SIMULATION OF ELECTRON-SCATTERING 
   K MURATA, M YASUDA, H KAWATA
   SCANNING, 17(4) 228-234, Jul, 1995  
   https://doi.org/10.1002%2Fsca.4950170403
2. EFFECTS OF HEAVY-ATOMS ADDED INTO A RESIST ON ENERGY-ABSORPTION IN X-RAY-LITHOGRAPHY 
   K MURATA, M YASUDA, H KAWATA, T MATSUDA
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 13(3) 821-825, May, 1995  Peer-reviewed
   https://doi.org/10.1116/1.587860
3. STUDY OF THE SPATIAL-DISTRIBUTION OF BACKSCATTERED ELECTRONS FROM A GOLD TARGET WITH A NEW MONTE-CARLO SIMULATION 
   M YASUDA, H KAWATA, K MURATA
   JOURNAL OF APPLIED PHYSICS, 77(9) 4706-4713, May, 1995  
   https://doi.org/10.1063/1.359439
4. Effects of heavy atoms added into a resist on energy absorption in x-ray lithography 
   Kenji Murata, Masaaki Yasuda, Hiroaki Kawata, Tadahito Matsuda
   Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 13(3) 821-825, May, 1995  
   https://doi.org/10.1116/1.587860
5. Analysis of backscattered electron signals from microstructures of steps and holes 
   K MURATA, Y IRISAWA, M YASUDA, H KAWATA
   MICROBEAM ANALYSIS 1995, 217-218, 1995  Peer-reviewed
   https://www.webofscience.com/wos/woscc/full-record/WOS:A1995BE26U00098

1994

1. RESIST HEATING EFFECT IN ELECTRON-BEAM LITHOGRAPHY 
   M YASUDA, H KAWATA, K MURATA, K HASHIMOTO, Y HIRAI, N NOMURA
   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 12(3) 1362-1366, May, 1994  
   https://doi.org/10.1116/1.587299

1992

1. THE SPATIAL-DISTRIBUTION OF BACKSCATTERED ELECTRONS REVISITED WITH A NEW MONTE-CARLO SIMULATION 
   K MURATA, M YASUDA, H KAWATA
   SCANNING MICROSCOPY, 6(4) 943-954, Dec, 1992  
   https://www.webofscience.com/wos/woscc/full-record/WOS:A1992KK54800008

1989

1. 0.1-MUM FINE-PATTERN FABRICATION USING VARIABLE-SHAPED ELECTRON-BEAM LITHOGRAPHY 
   K HASHIMOTO, M YASUDA, Y HIRAI, K KAWAKITA, N NOMURA, K MURATA
   JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 28(12) L2281-L2283, Dec, 1989  
   https://doi.org/10.1143/JJAP.28.L2281